About 212 new students were admitted into Best Solution Polytechnic, Akure during the 2016/2017 matriculation ceremony of the Institution held recently.
Speaking at the event, the former Vice Chancellor of FUTA, Prof. Bisi Balogun admonished the matriculating students to demonstrate industry, enterprise and thrift as well as support and cooperation with the management in order to achieve lofty goals and aspirations for a better future. While congratulating the new students on their admission to the Polytechnic, the President, Dr. Mike Abiodun said: “It is indeed a pride to be admitted into BESTPOTECH where you will be expected to study very hard and be certified worthy in character and learning in order to build a successful and rewarding future for yourselves”.
He stated that among the over 500 students who applied for admission to the Polytechnic, they were one of the selected few, enjoying the privilege of admission into BESTPOTECH after passing through a keenly competitive selection process of the Polytechnic.
Dr Mike Abiodun reiterated that the Polytechnic requires synergy among stakeholders among whom students are an integral part.
He urged them to key into the vision of the Institution, which is to provide multi-level technological, scientific and entrepreneurial training and research for elf reliance and National Development. The Rector, Mrs Abiodun Adejoke stated that the students’ Matriculation Oath is sacred and must not be breached adding that all regulations must be complied with and constituted authorities respected at all times. She warned the students to shun acts inimical to peace on campus especially cultism urging them to be law abiding and to refrain from joining or associating with unlawful groups as management will not hesitate to deal with erring recalcitrant offenders within the ambit of the Polytechnic rules and regulations.
High-point of the event was the administration of the matriculation oaths on the students by the Registrar, Mr. Bolanle Abiodun, with leaders of the academic community, parents and guardians in attendance.